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Home › Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

US Patent 6893337 · Granted May 17, 2005

Estimated economic value: $941,000 ⓘ

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