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Home › Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates

US Patent 6537136 · Granted Mar 25, 2003

Estimated economic value: $1,989,000 ⓘ

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