Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Selective polishing with slurries containing polyelectrolytes

Selective polishing with slurries containing polyelectrolytes

US Patent 6824579 · Granted Nov 30, 2004

Estimated economic value: $6,459,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-encapsulated silver alloys for interconnects2010
Self-encapsulated silver alloys for interconnects2009
Self-encapsulated silver alloys for interconnects2007
Selective polishing with slurries containing polyelectrolytes2005
Sliding window structure with sash guiding tracks2005
Polishing compositions and use thereof2003
Method of forming a solute-enriched layer in a substrate surface and article for2002
Dual-valent rare earth additives to polishing slurries2001
Apparatus and method for forming thin film using ink-jet mechanism2001
Dual-valent rare earth additives to polishing slurries2000
Method of forming conductive lines on a semiconductor wafer1999
CMP process using indicator areas to determine endpoint1999