Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Correcting a mask pattern using a clip mask

Correcting a mask pattern using a clip mask

US Patent 6807661 · Granted Oct 19, 2004

Estimated economic value: $15,318,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Sub-resolution assist feature to improve symmetry for contact hole lithography2011
Sub-resolution assist feature to improve symmetry for contact hole lithography2009
Method and system for contiguous proximity correction for semiconductor masks2008
Double pattern and etch of poly with hard mask2004
Correcting a mask pattern using multiple correction grids2004
Method and system for mask pattern correction2004