Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Rapid thermal processing chamber for processing multiple wafers

Rapid thermal processing chamber for processing multiple wafers

US Patent 6727474 · Granted Apr 27, 2004

Estimated economic value: $9,119,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Heating device for heating semiconductor wafers in thermal processing chambers2012
Heating device for heating semiconductor wafers in thermal processing chambers2009
Fast heating and cooling apparatus for semiconductor wafers2007
Heating device for heating semiconductor wafers in thermal processing chambers2006
Method for rapidly heating and cooling semiconductor wafers2005
Heating device for heating semiconductor wafers in thermal processing chambers2004
Heating device for heating semiconductor wafers in thermal processing chambers2004
Rapid thermal processing chamber for processing multiple wafers2003
System for controlling the temperature of a reflective substrate during rapid he2002
System for controlling the temperature of a reflective substrate during rapid he2002
Rapid thermal processing chamber for processing multiple wafers2001
Heating device for semiconductor wafers1999