Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for reducing edge roughness in patterned photoresist

Process for reducing edge roughness in patterned photoresist

US Patent 6709807 · Granted Mar 23, 2004

Estimated economic value: $7,307,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Copy prevention of digital sample images2025
Method and/or system for coating a substrate2025
System for coating a substrate2022
Process for optically erasing charge buildup during fabrication of an integrated2004
Method of photoresist ash residue removal2004
Process for optically erasing charge buildup during fabrication of an integrated2003
Process for reducing edge roughness in patterned photoresist2003
Process for reducing edge roughness in patterned photoresist2003
Process for removal of photoresist after post ion implantation2003
UV assisted chemical modification of photoresist2003
UV assisted chemical modification of photoresist2003
Treatment of dielectric materials2002