Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of fabricating mask read only memory

Method of fabricating mask read only memory

US Patent 6670247 · Granted Dec 30, 2003

Estimated economic value: $11,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for controlling silicon nitride etching tank2014
Apparatus and method for controlling silicon nitride etching tank2013
Isolation structures and methods of fabricating isolation structures2011
Wet cleaning solution2011
Integrated circuits with stress memory effect and fabrication methods thereof2010
Method for fabricating semiconductor device with silicided gate2010
Method for fabricating read only memory including a first and second exposures t2006
Method for fabricating read only memory including forming masking layers with op2004
Method for manufacturing semiconductor device containing a silicon-rich layer2002
Method of forming damascene structure2002
Method of manufacturing flash memory2002
Method to improve nitride floating gate charge trapping for NROM flash memory de2002