Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing of copper-oxide damascene structures

Chemical mechanical polishing of copper-oxide damascene structures

US Patent 6667239 · Granted Dec 23, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for polishing substrate2019
System and method for polishing substrate2017
Method and system for managing operations and processes in healthcare delivery i2011
Method and system to compensate for scanner system timing variability in a semic2006
Recipe cascading in a wafer processing system2006
Apparatus and method for chemical mechanical polishing of substrates2006
Apparatus and method for chemical mechanical polishing of substrates2006
Robot pre-positioning in a wafer processing system2005
Robot pre-positioning in a wafer processing system2005
In-situ method and apparatus for end point detection in chemical mechanical poli2004
Method and apparatus for resolving conflicts in a substrate processing system2004
Method and apparatus for resolving conflicts in a substrate processing system2004