Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for the preparation of an epitaxial silicon wafer with intrinsic gettering

Method for the preparation of an epitaxial silicon wafer with intrinsic gettering

US Patent 6666915 · Granted Dec 23, 2003

Estimated economic value: $23,928,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Energy modulation systems for diffraction based holographic displays2024
Foldable aerodynamic drag reducing plate assembly for an intermodal container2020
Foldable aerodynamic drag reducing plate assembly for a domestic or intermodal c2020
Package, packaging method and substrate thereof for sliding type thin fingerprin2011
Epitaxial silicon wafer with intrinsic gettering and a method for the preparatio2005
Polishing pad window for a chemical-mechanical polishing tool2005
Modified susceptor for use in chemical vapor deposition process2003
Method and apparatus for forming a silicon wafer with a denuded zone2003
Epitaxial silicon wafer free from autodoping and backside halo and a method and 2003
Epitaxial silicon wafer with intrinsic gettering and a method for the preparatio2003
Modified susceptor for use in chemical vapor deposition process2002
Epitaxial silicon wafer with intrinsic gettering2001