Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Modified susceptor for use in chemical vapor deposition process

Modified susceptor for use in chemical vapor deposition process

US Patent 6652650 · Granted Nov 25, 2003

Estimated economic value: $9,152,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for forming single crystal silicon ingots with improved resistivity cont2024
Radio frequency silicon on insulator structure with superior performance, stabil2024
Energy modulation systems for diffraction based holographic displays2024
Radio frequency silicon on insulator wafer platform with superior performance, s2024
Resistivity stabilization measurement of fat neck slabs for high resistivity and2023
Radio frequency silicon on insulator structure with superior performance, stabil2023
Radio frequency silicon on insulator wafer platform with superior performance, s2022
Radio frequency silicon on insulator structure with superior performance, stabil2021
Radio frequency silicon on insulator wafer platform with superior performance, s2021
Methods for forming single crystal silicon ingots with improved resistivity cont2021
Sample rod growth and resistivity measurement during single crystal silicon ingo2020
Foldable aerodynamic drag reducing plate assembly for an intermodal container2020