Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming high resistance resistor with integrated high voltage device process

Method for forming high resistance resistor with integrated high voltage device process

US Patent 6624079 · Granted Sep 23, 2003

Estimated economic value: $3,500,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Protective housing for a mobile device2024
Protective housing for a mobile device2021
Method for forming fuse pad and bond pad of integrated circuit2016
Antenna structure2012
Method of fabrication LCOS structure2004
Method of fabrication LCOS structure2004
Method of fabrication LCOS structure2004
Method of forming an opening through an insulating layer of a semiconductor devi2004
Method for reducing gate length bias2003
Method for reducing gate length bias2003
Method of reducing leakage current of a semiconductor wafer2002
Method for integrating CMOS sensor and high voltage device2002