Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Laser-assisted silicide fuse programming

Laser-assisted silicide fuse programming

US Patent 6607945 · Granted Aug 19, 2003

Estimated economic value: $7,296,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods that selectively modify liner induced stress2011
Formation of a silicon oxide interface layer during silicon carbide etch stop de2010
Energy beam treatment to improve packaging reliability2010
Systems and methods that selectively modify liner induced stress2008
Methods to facilitate etch uniformity and selectivity2008
Method to increase mechanical fracture robustness of porous low k dielectric mat2008
Plasma treatment for silicon-based dielectrics2007
Post-polish treatment for inhibiting copper corrosion2007
Method of passivating and/or removing contaminants on a low-k dielectric/copper 2006
System for improving thermal stability of copper damascene structure2005
Depth of focus (DOF) for trench-first-via-last (TFVL) damascene processing with 2005
Method for fabricating semiconductor devices that uses efficient plasmas2004