Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition

RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition

US Patent 6533894 · Granted Mar 18, 2003

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Data storage device and method for hybrid space balancing based on host read aff2025
Methods of forming nanostructures utilizing self-assembled nucleic acids2025
Substrateless double-sided embedded multi-die interconnect bridge2025
Method of forming photonics structures2025
String driver assemblies including two-dimensional materials, and related memory2025
Epitaxial single crystalline silicon growth for a horizontal access device2025
Nested architectures for enhanced heterogeneous integration2025
Alternative surfaces for conductive pad layers of silicon bridges for semiconduc2025
EMIB architecture with dedicated metal layers for improving power delivery2025
Driver placement in memories having stacked memory arrays2025
Metal-free frame design for silicon bridges for semiconductor packages2024
Nested architectures for enhanced heterogeneous integration2024