{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Diffraction spectral filter for use in extreme-UV lithography condenser", "item": "https://www.patentleaderboard.com/patent/6469827"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Diffraction spectral filter for use in extreme-UV lithography condenser

Diffraction spectral filter for use in extreme-UV lithography condenser

US Patent 6469827 · Granted Oct 22, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Non-contact rapid reader system for reflective particle tags2020
Microsystem enabled photovoltaic modules and systems2017
Solar photovoltaic reflective trough collection structure2015
Microsystem enabled photovoltaic modules and systems2015
Method to create gradient index in a polymer2014
Photovoltaic system2014
Method to fabricate a tilted logpile photonic crystal2010
Projection screen having reduced ambient light scattering2010
Laser warning receiver to identify the wavelength and angle of arrival of incide2010
Method and apparatus for creating a topography at a surface2008
Spatial light modulator features2008
Laser remote sensing of backscattered light from a target sample2008