Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Wafer dryer comprising revolving spray nozzle and method for drying wafers using the same

Wafer dryer comprising revolving spray nozzle and method for drying wafers using the same

US Patent 6460269 · Granted Oct 8, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection welding device2017
Animal training apparatus with radio transceiver2016
Welded portion quality determining system2015
Multi-chamber system having compact installation set-up for an etching facility 2010
Method of forming a contact in a semiconductor device2009
Multi-chamber system having compact installation set-up for an etching facility 2005
Semiconductor wafer cleaning apparatus and method of using the same2004
Semiconductor wafer cleaning apparatus and method of using the same2004
Multi-chamber system having compact installation set-up for an etching facility 2003
Method of manufacturing semiconductor devices, etching compositions for manufact2002
Process tube having slit type process gas injection portion and hole type waste 2002
Wet-etching facility for manufacturing semiconductor devices2001