Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Techniques for improving etching in a plasma processing chamber

Techniques for improving etching in a plasma processing chamber

US Patent 6410451 · Granted Jun 25, 2002

Estimated economic value: $5,986,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Kite flying device2015
Solderability enhancement by silver immersion printed circuit board manufacture2015
Process for silver plating in printed circuit board manufacture2014
Process for silver plating in printed circuit board manufacture2014
Platen for cut sheet feeder2009
Cut sheet feeder2009
Methods and apparatus for the optimization of highly selective process gases2009
Method and apparatus for reducing He backside faults during wafer processing2005
Printed circuit board manufacture2005
Method and apparatus for reducing He backside faults during wafer processing2004
Perforated plasma confinement ring in plasma reactors2003
Printed circuit board manufacture2002