{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube", "item": "https://www.patentleaderboard.com/patent/6402900"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

System and method for performing sputter deposition using ion sources, targets and a substrate arranged about the faces of a cube

US Patent 6402900 · Granted Jun 11, 2002

Assignee

Inventors

View full patent text on Google Patents →