Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for forming anti-reflective film for semiconductor fabrication using extremely short wavelength deep ultraviolet photolithography

Process for forming anti-reflective film for semiconductor fabrication using extremely short wavelength deep ultraviolet photolithography

US Patent 6365320 · Granted Apr 2, 2002

Estimated economic value: $3,760,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and methods for supporting workpieces during plasma processing2018
Apparatus and method for intraluminal polymer deposition2016
Apparatus and methods for handling workpieces of different sizes2016
Methods of fabricating electronics assemblies2013
Syringes with a reduced susceptibility to freeze-thaw void formation and methods2012
Passivation layer for semiconductor device packaging2012
Syringes with a reduced susceptibility to freeze-thaw void formation and methods2012
Method of copper/copper surface bonding using a conducting polymer for applicati2008
Run to run control process for controlling critical dimensions2007
Method of copper/copper surface bonding using a conducting polymer for applicati2006
Method of copper/copper surface bonding using a conducting polymer for applicati2005
Process for forming bottom anti-reflection coating for semiconductor fabrication2005