Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing slurry and method for polishing metal/oxide layers

Chemical mechanical polishing slurry and method for polishing metal/oxide layers

US Patent 6294105 · Granted Sep 25, 2001

Estimated economic value: $32,998,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compositions and methods for measuring bacterial growth2025
Compositions and methods for measuring bacterial growth2022
Micro-electro-mechanical system (MEMS) structures and design structures2021
Micro-electro-mechanical system (MEMS) structures and design structures2020
Micro-electro-mechanical system (MEMS) structures and design structures2020
Micro-electro-mechanical system (MEMS) structures and design structures2020
Semiconductor structures having low resistance paths throughout a wafer2019
Controlling of etch depth in deep via etching processes and resultant structures2019
Planar cavity MEMS and related structures, methods of manufacture and design str2019
Semiconductor structures having low resistance paths throughout a wafer2019
Micro-Electro-Mechanical System (MEMS) structures and design structures2018
Method for forming micro-electro-mechanical system (MEMS) beam structure2018