Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming a perovskite thin film using a sputtering method with a fully oxidized perovskite target

Method for forming a perovskite thin film using a sputtering method with a fully oxidized perovskite target

US Patent 6210545 · Granted Apr 3, 2001

Estimated economic value: $36,356,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-aligned, over etched hard mask fabrication method and structure2021
Tool and method of fabricating a self-aligned solid state thin film battery2021
Feedback control of dimensions in nanopore and nanofluidic devices2021
Techniques to improve reliability in Cu interconnects using Cu intermetallics2021
Techniques to improve reliability in Cu interconnects using Cu intermetallics2020
Self-aligned 3D solid state thin film battery2020
Self-aligned, over etched hard mask fabrication method and structure2020
Techniques to improve reliability in Cu interconnects using Cu intermetallics2019
Feedback control of dimensions in nanopore and nanofluidic devices2019
Feedback control of dimensions in nanopore and nanofluidic devices2019
DNA sequencing using multiple metal layer structure with different organic coati2019
Techniques for fabricating horizontally aligned nanochannels for microfluidics a2018