Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for cleaning substrate surfaces after etch operations

Methods for cleaning substrate surfaces after etch operations

US Patent 6187684 · Granted Feb 13, 2001

Estimated economic value: $21,266,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Polymer based roll coating2019
Method and system for uniformly applying a multi-phase cleaning solution to a su2014
Method and apparatus for cleaning a substrate using non-newtonian fluids2014
Method and system for uniformly applying a multi-phase cleaning solution to a su2013
Method and apparatus for cleaning semiconductor wafers using compressed and/or p2013
Method and apparatus for cleaning a substrate using non-Newtonian fluids2011
Method and apparatus for uniformly applying a multi-phase cleaning solution to a2011
Reducing mechanical resonance and improved distribution of fluids in small volum2010
Brush core assembly2010
Controls of ambient environment during wafer drying using proximity head2009
Method and apparatus for cleaning semiconductor wafers using compressed and/or p2009
System and method for producing bubble free liquids for nanometer scale semicond2008