Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optical member for photolithography, method for evaluating optical member, and photolithography apparatus

Optical member for photolithography, method for evaluating optical member, and photolithography apparatus

US Patent 6181469 · Granted Jan 30, 2001

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Exposure apparatus and device manufacturing method2011
Exposure apparatus and device manufacturing method2009
Socket for electrical parts2006
Method for producing optical member2006
Optical system and exposure apparatus provided with the optical system2005
Projection optical system and an exposure apparatus with the projection optical 2004
Optical member for photolithography and method of evaluating the same2004
Method of manufacturing silica glass member and silica glass member obtained by 2004
Product method of synthetic silica glass and thermal treatment apparatus2004
Illumination optical system and method of making exposure apparatus2004
Exposure apparatus2004
Silica glass member, method for producing the same, and projection aligners usin2004