{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method of fabricating a buried contact", "item": "https://www.patentleaderboard.com/patent/6153498"}]}
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Method of fabricating a buried contact

US Patent 6153498 · Granted Nov 28, 2000

Estimated economic value: $1,080,000 ⓘ

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