Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of fabricating a dual damascene structure

Method of fabricating a dual damascene structure

US Patent 6180516 · Granted Jan 30, 2001

Estimated economic value: $2,214,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electrode structure adapted for high applied voltage and fabrication method ther2013
Electrostatic discharge protective circuit2003
Electrostatic discharge protection apparatus2002
Method of fabricating flash memory cell using two tilt implantation steps2002
Method of forming dielectric layer with low dielectric constant2001
Method of manufacturing borderless contact2001
Electrostatic discharge device2001
Method of manufacturing electrostatic discharge protective circuit2001
Three-dimensional, deep-trench, high-density read-only memory (ROM) and its manu2001
Dual damascene manufacturing process2001
Method of manufacturing self-aligned contact2001
Method of forming damascene structure having borderless via design2001