Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Patterning method utilizing electron beam resist containing methanofullerene compound

Patterning method utilizing electron beam resist containing methanofullerene compound

US Patent 6117617 · Granted Sep 12, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Printed circuit board2025
Semiconductor storage device2024
Compound film of tungsten and germanium, and semiconductor device2020
Trigger-type sprayer2020
Sprayer with handle2020
Pump dispenser2019
Method for producing particulate clusters2019
Push pump dispenser2019
Trigger-type pump dispenser2018
Trigger type sprayer2017
Trigger-type pump dispenser2017
Push-type dispenser2017