Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Controlled amine poisoning for reduced shrinkage of features formed in photoresist

Controlled amine poisoning for reduced shrinkage of features formed in photoresist

US Patent 6057084 · Granted May 2, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and/or system for coating a substrate2025
System for coating a substrate2022
Process for optically erasing charge buildup during fabrication of an integrated2004
Process for reducing edge roughness in patterned photoresist2004
Process for optically erasing charge buildup during fabrication of an integrated2003
Process for reducing edge roughness in patterned photoresist2003
UV assisted chemical modification of photoresist2003
Treatment of dielectric materials2002
Method of stripping photoresist using re-coating material2002
Controlled amine poisoning for reduced shrinkage of features formed in photoresi2001
Controlled shrinkage of photoresist2000
Method and apparatus for applying a layer of a fluid material on a semiconductor1992