Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical planarization system and method therefor

Chemical mechanical planarization system and method therefor

US Patent 5945346 · Granted Aug 31, 1999

Estimated economic value: $15,455,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pad conditioner coupling and end effector for a chemical mechanical planarizatio2004
Fixed abrasive planarization pad conditioner incorporating chemical vapor deposi2003
Wafer carrier and method of material removal from a semiconductor wafer2003
Filter apparatus and method therefor2003
Carrier assembly for chemical mechanical planarization systems and method2003
Pad conditioner coupling and end effector for a chemical mechanical planarizatio2003
Translation mechanism for a chemical mechanical planarization system and method 2002
Filter apparatus and method therefor2002
Point of use dilution tool and method2002
Method of manufacturing a semiconductor component and chemical-mechanical polish2001
Pad conditioner coupling and end effector for a chemical mechanical planarizatio2001
Chemical mechanical planarization system2000