Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment

In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment

US Patent 5943130 · Granted Aug 24, 1999

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System, device and method for measuring the interior refractory lining of a vess2024
Characterization of refractory lining of metallurgical vessels using autonomous 2019
Scanning laser range finder with surface temperature measurement using two-color2018
Apparatuses, processes, and systems for measuring particle size distribution and2016
Caster mold measurements using a scanning range finder2016
Apparatus, process, and system for monitoring the integrity of containers2015
Laser-based apparatus and method for measuring agglomerate concentration and mea2011
Laser-based apparatus and method for measuring agglomerate concentration and mea2010
Automated positioning method for contouring measurements using a mobile range me2005
Signal processing method for in-situ, scanned-beam particle monitoring2005
Signal processing method for in-situ, scanned-beam particle monitoring2005
Method for measuring particle size in the presence of multiple scattering1997