Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Collar etch method to improve polysilicon strap integrity in DRAM chips

Collar etch method to improve polysilicon strap integrity in DRAM chips

US Patent 5930585 · Granted Jul 27, 1999

Estimated economic value: $22,178,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for treating complementary regions of the surface of a substrate and sem2004
Method of forming first level of metallization in DRAM chips2004
Method of forming STI oxide regions and alignment marks in a semiconductor struc2002
Method and system for semiconductor wafer fabrication process real-time in-situ 2002
Method of forming buried straps in DRAMs2001
Method for buried plate formation in deep trench capacitors2001
Method of forming metal lands at the M0 level with a non selective chemistry2001
Method for planarizing TEOS SiO.sub.2 filled shallow isolation trenches1999