Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing antenna effect during plasma etching procedure for semiconductor device fabrication

Method for reducing antenna effect during plasma etching procedure for semiconductor device fabrication

US Patent 5910452 · Granted Jun 8, 1999

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Top-gate transistor array substrate2013
Manufacturing method of a thin film transistor2012
Thin film transistor and manufacturing method thereof2012
Microsensor with ferroelectric material and method for fabricating the same2008
Analog output buffer circuit for flat panel display2008
Structure of organic light-emitting TFT LCD and method of making the same2005
Power chip set for a switching mode power supply having a device for providing a2005
Method for making a structure of organic light-emitting material TFT display2005
Process for forming field emission electrode for manufacturing field emission ar2004
Structure of organic light-emitting material TFT LCD and the method for making t2004
Structure of organic light-emitting TFT LCD and method of making the same2004
Backlight module of liquid crystal display2003