Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mesa isolation Refill Process for Silicon on Insulator Technology Using Flowage Oxides as the Refill Material

Mesa isolation Refill Process for Silicon on Insulator Technology Using Flowage Oxides as the Refill Material

US Patent 5882981 · Granted Mar 16, 1999

Estimated economic value: $61,355,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for array of MEMS elements2025
Barrier structure within a microelectronic enclosure2025
System and method for MEMS devices2025
Multi-level microelectromechanical system structure with non-photodefinable orga2025
Erasable writable substrates and methods of manufacture2025
Electrostatic actuator with 4-bit digital electrode2024
Erasable writable materials2023
Adjustable, controlled rate plant watering device2023
Erasable writable materials2021
Large format erasable writable surfaces2020
Erasable Writable Materials2020
Dielectric cladding of microelectromechanical systems (MEMS) elements for improv2018