Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for fabricating a device using polarized light to determine film thickness

Process for fabricating a device using polarized light to determine film thickness

US Patent 5835221 · Granted Nov 10, 1998

Estimated economic value: $45,052,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System for and method of fast pulse gas delivery2021
Plasma doping using a solid dopant source2019
System for and method of fast pulse gas delivery2019
System for and method of fast pulse gas delivery2018
Self-compensating oxide layer2016
Techniques for plasma processing a substrate2015
Technique for manufacturing bit patterned media2015
Pulsed plasma to affect conformal processing2014
Apparatus for detecting film delamination and a method thereof2014
Technique for processing a substrate having a non-planar surface2014
Self-aligned masking for solar cell manufacture2013
Stencil mask profile2013