Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Techniques for plasma processing a substrate

Techniques for plasma processing a substrate

US Patent 9123509 · Granted Sep 1, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Total or local thickness variation for optical devices2025
Airgap structures for improved eyepiece efficiency2025
Atomic layer deposition on optical structures2025
Methods for high-resolution, stable measurement of pitch and orientation in opti2025
Methods, systems, and apparatus for inkjet printing self-assembled monoloayer (S2025
Ion implantation to modify glass locally for optical devices2025
Method of measuring efficiency for optical devices2025
High index edge blackening material2025
Methods for preparing small features on a substrate2025
Plasma based film modification for semiconductor devices2025
Total or local thickness variation for optical devices2025
Process for producing spheroidized powder from feedstock materials2025