Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor

Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor

US Patent 5716870 · Granted Feb 10, 1998

Estimated economic value: $398,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of lithium extraction from sedimentary clay2025
Indexing video for retail investigations2021
Drying procedure in manufacturing process for cathode material2020
Tool shank2019
Flexible laser manufacturing systems and associated methods of use and manufactu2016
Camera installation for trailer2015
Enterprise-wide camera data2015
RFID tags for locating products2015
Multi-stage air filtration systems and associated apparatuses and methods2015
Mobile device cover with theft protection2015
Digital sign with incorrectly stocked item identification2015
Semi-trailer with external switch2014