Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Hybrid illumination system for use in photolithography

Hybrid illumination system for use in photolithography

US Patent 5631721 · Granted May 20, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wide angle MWIR F-theta lens2025
Midwave infrared discrete zoom lens2024
MWIR lens for remote sensing2023
Wide field of view F-theta lens2020
Orthoscopic projection lens2020
Compact orthoscopic VNIR/SWIR lens2020
Compact and athermal VNIR/SWIR spectrometer2019
Airborne hyperspectral scanning system with reflective telecentric relay2016
Wide field athermalized orthoscopic lens system2016
Low distortion athermalized imaging lens2014
Wide field athermalized orthoscopic lens system2014
Athermal apochromatic telecentric F-theta lens with low F-number2013