Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for making a semiconductor device including diffusion control

Method for making a semiconductor device including diffusion control

US Patent 5500391 · Granted Mar 19, 1996

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Horizontal GAA nano-wire and nano-slab transistors2025
Method for precision oxidation control by ion implantation2025
Method and apparatus for controlled ion implantation2025
Method and apparatus for displaying emoji reply, terminal device, and server2024
System and technique for creating implanted regions using multiple tilt angles2024
Techniques to increase CMOS image sensor well depth by cyrogenic ion channeling 2023
Channeled implants for SiC MOSFET fabrication2023
System and method for hi-precision ion implantation2023
System and technique for profile modulation using high tilt angles2023
Horizontal GAA nano-wire and nano-slab transistors2022
System and technique for creating implanted regions using multiple tilt angles2022
Angled ion implant to reduce MOSFET trench sidewall roughness2022