Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and technique for creating implanted regions using multiple tilt angles

System and technique for creating implanted regions using multiple tilt angles

US Patent 11476330 · Granted Oct 18, 2022

Estimated economic value: $26,737,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Horizontal GAA nano-wire and nano-slab transistors2025
Method for precision oxidation control by ion implantation2025
Method and apparatus for controlled ion implantation2025
Highly etch selective amorphous carbon film2024
Highly etch selective amorphous carbon film2024
System and technique for creating implanted regions using multiple tilt angles2024
System and technique for creating implanted regions using multiple tilt angles2024
Techniques to increase CMOS image sensor well depth by cyrogenic ion channeling 2023
Channeled implants for SiC MOSFET fabrication2023
System and method for hi-precision ion implantation2023
Method for fabrication of NIR CMOS image sensor2023
System and technique for profile modulation using high tilt angles2023