Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes

Thin film deposition apparatus, mainly dedicated to PECVD and sputtering techniques and respective processes

US Patent 5466296 · Granted Nov 14, 1995

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of thin film deposition under reactive conditions with RF or pulsed DC pl2004
Portable apparatus for thin deposition2000
Portable apparatus for thin deposition2000
Method for making plastic film with barrier layers1999
Method for making plastic film with barrier layers1999
Method of and apparatus for making plastic film with barrier layers1998
Method of and apparatus for making plastic film with barrier layers1998
Process for continuous reactive metal oxide formation in vacuum1996
Process for continuous reactive metal oxide formation in vacuum1996
Apparatus for continuous reactive metal deposition in vacuum with web looping ov1995
Apparatus for continuous reactive metal deposition in vacuum with web looping ov1995
Thin film multilayer structure as permeation barrier on plastic film1995