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Home › Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present

Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present

US Patent 5322757 · Granted Jun 21, 1994

Estimated economic value: $1,203,000 ⓘ

Assignee

Ocg Microelectronic Materials

Inventors

Charles E. Ebersole (3 patents)

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