Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5324620 | Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde | — | 1994-06-28 |
| 5322757 | Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present | — | 1994-06-21 |
| 5237037 | Radiation-sensitive compositions containing fully substituted novolak polymers | — | 1993-08-17 |