Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation

Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation

US Patent 5273856 · Granted Dec 28, 1993

Estimated economic value: $10,686,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods, devices, systems, and compositions for detecting gases2019
Methods to determine a bearing setting2018
Orally dissolving thin films containing allergens and methods of making and use2017
Charge storage device for detecting alpha particles2014
Method and system for detecting the level of anesthesia agent in an anesthesia v2013
System and method for detecting particles with a semiconductor device2013
Polymer dielectrics for memory element array interconnect2009
Methods for designing grating structures for use in situ scatterometry to detect2008
Method for semiconductor gate line dimension reduction2007
Method of using carbon spacers for critical dimension (CD) reduction2007
Immersion lithographic process using a conforming immersion medium2006
Patterning with rigid organic under-layer2006