Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Materials and methods for etching silicides, polycrystalline silicon and polycides

Materials and methods for etching silicides, polycrystalline silicon and polycides

US Patent 5219485 · Granted Jun 15, 1993

Estimated economic value: $8,505,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Low temperature deposition of iridium containing films2024
Techniques for personalizing app store recommendations2023
Low temperature deposition of iridium containing films2023
Apparatus for increasing flux from an ampoule2023
Lyric search service2023
Apparatus and method for providing uniform flow of gas2022
Lyric search service2021
Apparatus for increasing flux from an ampoule2021
Method and system for using saved search results in menu structure searching for2021
High temperature process chamber lid2020
Method and system for storing program guide data in a user device2020
Doped tantalum nitride for copper barrier applications2020