Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and a method for high numerical aperture microscopic examination of materials

Apparatus and a method for high numerical aperture microscopic examination of materials

US Patent 5208648 · Granted May 4, 1993

Estimated economic value: $10,309,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Detection of road surface defects2021
Photonic waveguide coupling using offset light source2020
Photonic waveguide coupling using offset light source2019
Electro-optic phase modulator with no residual amplitude modulation2018
Near-threshold optical transmitter pre-distortion2017
Shadow contouring process for integrating 2D shadow characters into 3D scenes2016
Silicon photonics wafer using standard silicon-on-insulator processes through su2014
Method and apparatus providing fine alignment of a structure relative to a suppo2014
Method of concetrating solar energy2013
Method and apparatus providing fine alignment of a structure relative to a suppo2013
Tinting a surface to simulate a visual effect in a computer generated scene2012
Method, system, and computer program product for implementing stream processing 2012