Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine

Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine

US Patent 4987311 · Granted Jan 22, 1991

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multi-function module for an electron beam column2010
Electron anti-fogging baffle used as a detector2009
Electron beam column for writing shaped electron beams2008
Electron beam source having an extraction electrode provided with a magnetic dis2008
Electrostatic deflection system with low aberrations and vertical beam incidence2008
Electrostatic deflection system with impedance matching for high positioning acc2007
Method of exposing a target to a charged particle beam2005
Electron beam patterning with a heated electron source2004
Immersion lens with magnetic shield for charged particle beam system2004
Blanker assembly employing dielectric material2003
Electron gun having magnetic collimator2002
Raster scan gaussian beam writing strategy and method for pattern generation2001