Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Trilayer microlithographic process using a silicon-based resist as the middle layer

Trilayer microlithographic process using a silicon-based resist as the middle layer

US Patent 4891303 · Granted Jan 2, 1990

Estimated economic value: $2,365,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of fluorinating filters used in the manufacture of a semiconductor devic2020
Metrology of bilayer photoresist processes2011
Method for measuring contamination in liquids at PPQ levels2010
Method of making a semiconductor device using treated photoresist2007
Semiconductor process for disposable sidewall spacers2005
Method of forming a rim phase shifting mask and using the rim phase shifting mas2004
Method for manufacturing a lithographic reticle for transferring an integrated c2003
Attenuated rim phase shift mask2003
Method to produce masking2002
Bike transport rack2001
Photo-stimulated etching of CaF22001
Method of cleaning and treating a semiconductor device including a micromechanic2000