Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electron beam lithography system for delineating a desired pattern on a target by means of electron beams

Electron beam lithography system for delineating a desired pattern on a target by means of electron beams

US Patent 4868395 · Granted Sep 19, 1989

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cordierite-based sintered body, method for producing the same, and composite sub2021
Heat exchanger element, manufacturing method therefor, and heat exchanger2020
Half mirror, method for manufacturing the same and lighting unit using the same2019
Antibody titer-increasing agent using lactic acid bacterium2019
Mullite-containing sintered body, method for manufacturing the same, and composi2018
Information distribution apparatus, information distribution system, information2017
Piping system2017
Heat exchanger2017
Radiation generating unit and radiography system2015
Radiation generating tube, radiation generating unit, and radiation image taking2015
Method and program for creating determinate backup data in a database backup sys2014
Method of purifying 8-isoprostane2014