{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Vacuum deposition system with improved mass flow control", "item": "https://www.patentleaderboard.com/patent/4640221"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Vacuum deposition system with improved mass flow control

US Patent 4640221 · Granted Feb 3, 1987

Estimated economic value: $35,250,000

Assignee

Inventors

View full patent text on Google Patents →