Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming a silicon nitride film transparent to ultraviolet radiation and resulting article

Method of forming a silicon nitride film transparent to ultraviolet radiation and resulting article

US Patent 4618541 · Granted Oct 21, 1986

Estimated economic value: $3,904,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Combined transmittance and angle selective scattering measurement of fluid suspe2011
Integrated local and global optical metrology for samples having miniature featu2008
System and method for high intensity small spot optical metrology2008
Spectrophotometric system with reduced angle of incidence2008
Apparatus and method for optical characterization of a sample over a broadband o2008
System and method for measuring overlay alignment using diffraction gratings2007
Phase shift measurement using transmittance spectra2007
Apparatus and method for optical characterization of a sample over a broadband o2007
Method and apparatus for examining features on semi-transparent and transparent 2005
Computer-implemented reflectance system and method for non-destructive low dose 2004
Method of inferring optical parameters outside of a measurement spectral range2004
Method of monitoring thin-film processes and metrology tool thereof2003