Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of manufacturing SiO.sub.2 -Si interface for floating gate semiconductor device

Method of manufacturing SiO.sub.2 -Si interface for floating gate semiconductor device

US Patent 4597159 · Granted Jul 1, 1986

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System, method and program for designing a utility facility and method for manuf2010
Plating apparatus2009
Film coating unit and film coating method2009
Semiconductor device manufacturing method, semiconductor device manufacturing ap2006
Method of manufacturing semiconductor device including nonvolatile memory2006
Cleaning method for a semiconductor device manufacturing apparatus2006
Semiconductor manufacturing line availability evaluating system and design syste2006
Apparatus for predicting life of rotary machine and equipment using the same2005
Reliable semiconductor device and method of manufacturing the same2005
Method of manufacturing a semiconductor device2005
Method for predicting life of rotary machine and determining repair timing of ro2005
System for determining dry cleaning timing, method for determining dry cleaning 2004