Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silicon nitride S/D ion implant mask in CMOS device fabrication

Silicon nitride S/D ion implant mask in CMOS device fabrication

US Patent 4382827 · Granted May 10, 1983

Estimated economic value: $19,517,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process for forming MNOS dual dielectric structure1984
Polysilicon-doped-first CMOS process1983
Polysilicon-doped-first CMOS process1983
Self-aligned all-n.sup.+ polysilicon CMOS process1982
CISFET Processing including simultaneous doping of silicon components and FET ch1980
CISFET Processing including simultaneous implantation of spaced polycrystalline 1980